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dc.contributor.authorWitawat Ponhanen_US
dc.contributor.authorMeechai Thepnuraten_US
dc.contributor.authorSurachet Phadungdhitidhadaen_US
dc.contributor.authorDuangmanee Wongratanaphisanen_US
dc.contributor.authorSupab Choopunen_US
dc.date.accessioned2018-09-05T02:55:34Z-
dc.date.available2018-09-05T02:55:34Z-
dc.date.issued2016-11-25en_US
dc.identifier.issn02578972en_US
dc.identifier.other2-s2.0-84963976875en_US
dc.identifier.other10.1016/j.surfcoat.2016.04.022en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84963976875&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/55420-
dc.description.abstract© 2016 Elsevier B.V. In this work, we have investigated the thin film based field-effect transistor (FET) with interlinked ZnO tetrapod network (ITN-ZnO) used as an active channel layer. The ITN-ZnOs were synthesized by microwave assisted thermal oxidation technique. A ZnO FET with bottom gate structure was fabricated and investigated in terms of electrical properties. X-ray diffraction pattern revealed the wurtzite hexagonal structure of the ITN-ZnO. A drain current on/off ratio of 104, the off-state current as low as 10 nA, the threshold voltage of 10 V, field effect mobility of 7.939 cm2/Vs and sub-threshold swing of 1.4 V/decade were obtained. These results suggested that ITN-ZnO could be applied for FET, which could be operated in an enhancement mode.en_US
dc.subjectChemistryen_US
dc.subjectMaterials Scienceen_US
dc.subjectPhysics and Astronomyen_US
dc.titleElectrical properties of field-effect transistor with interlinked ZnO tetrapod network as an active layeren_US
dc.typeJournalen_US
article.title.sourcetitleSurface and Coatings Technologyen_US
article.volume306en_US
article.stream.affiliationsChiang Mai Universityen_US
article.stream.affiliationsCommission on Higher Educationen_US
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