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dc.contributor.authorDimitrios Louloudakisen_US
dc.contributor.authorWinai Thongpanen_US
dc.contributor.authorKyriakos Mouratisen_US
dc.contributor.authorEmmanouel Koudoumasen_US
dc.contributor.authorGeorge Kiriakidisen_US
dc.contributor.authorPisith Singjaien_US
dc.date.accessioned2019-03-18T02:22:59Z-
dc.date.available2019-03-18T02:22:59Z-
dc.date.issued2019-01-01en_US
dc.identifier.issn18626319en_US
dc.identifier.issn18626300en_US
dc.identifier.other2-s2.0-85059700459en_US
dc.identifier.other10.1002/pssa.201800513en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85059700459&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/63655-
dc.description.abstract© 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim Hexagonal tungsten trioxide (WO3) layers are grown on indium tin oxide (ITO) substrates using a novel spark deposition system. The effects of deposition time, substrate temperature, and oxygen (O2) flow rate through the chamber on the structural and morphological characteristics as well as the electrochemical response of the layers are examined. It is found that a deposition temperature of 400 °C and O2 flow rate at 60 mL min−1 through the chamber can result in hexagonal WO3 with improved crystallinity and quite effective electrochemical/electrochromic response.en_US
dc.subjectEngineeringen_US
dc.subjectMaterials Scienceen_US
dc.subjectPhysics and Astronomyen_US
dc.titleNovel Spark Method for Deposition of Metal Oxide Thin Films: Deposition of Hexagonal Tungsten Oxideen_US
dc.typeJournalen_US
article.title.sourcetitlePhysica Status Solidi (A) Applications and Materials Scienceen_US
article.stream.affiliationsChiang Mai Universityen_US
article.stream.affiliationsFoundation for Research and Technology-Hellas, Institute of Electronic Structure and Laseren_US
article.stream.affiliationsTechnologiko Ekpaideutiko Idrima, Kritisen_US
article.stream.affiliationsPanepistimion Patronen_US
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